Welcome to CORIAL

Corial WelcomeCORIAL is a process company that designs and manufactures plasma etching and deposition systems with innovative solutions dedicated to LED, OLED, MEMS and semiconductor compounds. We provide a wide range of tools based on the same mechanical, electronics and software platform. This modular approach allows a step by step investment from PECVD, RIE to highly sophisticated High Density Plasma systems with vacuum load-lock. CORIAL develops or customizes processes required for OLED, LED manufacturing (PSS) and for nanotechnologies involved in energy, healthcare, information and communication. CORIAL also provides a real time process support via internet access to the equipment.

Accueil-Machines-WS

Visit our partner
Evatec Process Systems

Corial and Evatec have teamed together to bring the flexibility, productivity and enterprise reliability of their respective technologies, products and services to provide advanced solutions that address customers evolving needs in LED, OLED and semiconductor compounds manufacturing.
 
Al_STM-WS 9-Metal-WS PSS-GP-WS GaN-Ni-mask-WS HR-Si_20nm-WS Microlens-in-SiO2-WS SiC-STM-WS Sapphire-BGU-WS HCD-GaAs-Isotrope-WS Superlattice-WS

News

  • PECVDs For LED Manufacturing
    • CORIAL introduces a very large area PECVD system for LED and OLED manufacturing, the Corial D500 which can accept: 104 X 2", 25 X 4" or 9 X 6" wafers.
  • News For PSS in LED Manufacturing
    • CORIAL achieves ±3% etch uniformity on 21 X 2" wafers for the PSS process used in LED manufacturing.
  • New orders for PSS
    Corial 300 Series
    • CORIAL got new multiple orders from China for its new Corial 300 series of RIE and ICP etchers.
  • Low Temperature ICP-CVD
    • A new ICP-CVD source with patent pending gas shower ...
    • A new ICP-CVD source with patent pending gas shower was developed for low temperature deposition of SiO2 and Si3N4. High quality films can be achieved at deposition temperature < 70°C!
    • Read more about the Corial 200D
  • New Etching Processes
    • Very high etching rates for single crystal SiC (> 1.8 µm/min) ...
    • Very high etching rates for single crystal SiC (> 1.8 µm/min) have been achieved for high power RF transistor manufacturing.

CORIAL - 11, Chemin du Vieux Chêne 38240 MEYLAN - France - Tel: +33 (0)4 76 01 10 10 - Fax: +33 (0)4 76 24 53 81
© Copyright 2009-2012 Corial
Licenced Work This work is licensed under a Creative Commons Attribution-Non commercial-No Derivative Works License.