Welcome to CORIAL

Corial WelcomeCORIAL is a company that designs and manufactures plasma etching and deposition systems with innovative processes dedicated to LED, OLED, MEMS and semiconductor compounds. We provide a wide range of tools based on the same mechanical, electronics and software platform. This modular approach allows a step by step investment from PECVD, RIE to highly sophisticated High Density Plasma systems with vacuum load-lock. CORIAL develops or customizes processes required for semiconductor compounds, Green IT, imaging, LEDs (PSS & GaN), OLEDs and lighting and for nanotechnologies involved in communication, energy, safety, healthcare and the environment. CORIAL also provides a real time process support via internet access to the equipment.

Visit our partner

Evatec Process Systems

Corial and Evatec have teamed together to bring the flexibility, productivity and enterprise reliability of their respective technologies, products and services to provide advanced solutions that address customers evolving needs in LED, OLED and semiconductor compounds manufacturing.

Gratings-InP-WS Sapphire-BGU-WS ZnS-CdTe-MCT-WS PSS-GP-WS GaN-Ni-mask-WS NanYa-M1-WS Microlens-in-SiO2-WS DSE-35m-WS SiO2-profond-WS 9-Metal-WS


New upgrade for the Corial 210IL 200 mm ICP-RIE etcher
  • Our R&D team has developped a removable aluminum liner for clean metal sputtering in RIE mode. The liner collects the non-volatile compounds produced during the sputtering process.
  • Only this part has to be cleaned after processing instead of the complete chamber.
  • The benefits are twofold: increase of system up-time and easier support of multi-users.

  • New etching processes for failure analysis of electronic devices
    • We extend the capabilities of the Corial 200I ICP system with etching processes targeted specifically at deprocessing of devices down to 20 nm.
    • Download the press release to learn more about dry etch solutions to remove polyimide, silicon nitride, silicon oxide, ILD,... layers.
    • Download

      • Meet Us at NanoIsrael 2016!
        • NanoIsrael 2016 is the fifth International Nanotechnology Conference & Exhibition in ISRAEL. This event will take place in Tel Aviv, ISRAEL on 22-23 February 2016.
        • CORIAL products will be represented by our local partner AVBA. We invite you to come and see AVBA on booth #19 and #20 to learn more about CORIAL etch and deposition platforms. Mrs Talia TZUK is looking forward to discussing your project.

          • New Issue out now!
            • Our new edition of the Newsletter Market Insights by CORIAL is now available!
            • Download your copy and read about Plasma technology and applications for the Failure Analysis sector
            • Download

              • New generation of 300 mm RIE system for photomask application
                • CORIAL introduces the new generation of manually loaded 300 mm RIE system, the Corial 300S, developped for Cr etching.
                • The improved Corial 300S features a new cathode design for higher Cr etching efficiency, a new shuttle design, and a laser EPD detector.
                • The CORIAL 300S system allows to get Cr etch rate > 50 nm/min and selectivity versus PR > 3.

CORIAL - 266, Chemin des Franques 38190 BERNIN - France - Tel: +33 (0)4 76 01 10 10 - Fax: +33 (0)4 76 24 53 81
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Licenced Work This work is licensed under a Creative Commons Attribution-Non commercial-No Derivative Works License.