Last update: 10 November 2008  
CORIAL SAS is a process company that designs and manufactures plasma etching and deposition equipment with innovative solutions dedicated to the semiconductor compounds, optoelectronics and MEMS industries. We provide a new range of equipment based on one single mechanical, electronics and software platform. This fully modular approach allows a step by step investment from RIE to highly sophisticated High Density Plasma systems with vacuum load-lock. CORIAL also customizes processes and provides the process support required by customers for nanotechnologies and new technologies for energy, health, information and communication.




 
Applications
Failure analysis
Optoelectronics
MEMS
Highlights
   New compact products available: 

   Size = 75 cm wide X 108 cm deep!

   
------------ Corial 200FA ---------------
Fast die deprocessing using
HCD (Hollow Cathode Discharge)

---------- Corial 200R ---------------
Cost effective RIE tool for 8" wafers

---------- Corial 200RL --------------
Cost effective RIE tool with
vacuum load-lock for 8" wafers

------------ Corial 200I ---------------
ICP etcher for die / wafer deprocessing

---------- Corial 200IL --------------
ICP etcher
with vacuum load-lock
Special design for sapphire etching!
 

---------- Corial D250L -------------
High performance PECVD tool with
vacuum load-lock operating at 325°C
 

         New processes available:

- ICP of Sapphire with high throughput,

- Fast ICP of GaAs via-holes,

- Fast ICP of SiC via-holes,

- Low damage GaN etching,

- High resolution Si etching (20 nm),

- SiC and aSi-H deposition,

- Liquid sources available, 

- Superlattice deposition. 


 

           Product Key Features:

- Highly Versatile (many applications
in the same process chamber),

- Stress control of high quality films,

- Low Cost of Ownership,

- Real-time process support through internet.






 
 
CORIAL SAS   11, Chemin du Vieux Chêne   38240 MEYLAN - France - Tel: +33 (0)4 76 01 10 10 - Fax: +33 (0)4 76 24 53 81