Corial D250L

* A vacuum vessel containing a high temperature isothermal reactor (Maximum temperature = 325°C),
* A circular shape plasma reactor designed for uniform deposition on 10 X 2” wafers or on wafers up to 200 mm,
* Two heating cables, two thermocouples, Eurotherm and IR reflectors for highly uniform heating of plasma reactor,
* Pumping system including Alcatel ADP 122P dry pump rated at 95 m3/h and Alcatel turbomolecular pump ATH 31 C (30 l/s),
* Soft rough pumping and venting to minimize particulate contamination,
* Capacitance gauge  0 - 2 Torr for working pressure monitoring,
* Automatic pressure control using a mass flow controller (UPC),
* CPU process controller (Processor ARM 926 180 MHz,  embedded software in 128 Mo Compact Flash , fast Ethernet link 100 MHz, 64 Mo of SDRAM, CAN bus, RS232),
* A set of digital and analogic Input/output module with a ARM7 processor connected to the CPU process controller via CAN bus for driving the physical devices,
* Gas box with 6 MFCs (SF6, N2, N20, NH3, Ar, SiH4) - Max: 9 gas lines,
* 300 W RF generator at 13.56 MHz and automatic match box,
* Graphic User Interface through IBM PC operating under Linux and Firefox. It is equipped with Intel Quad-Core processor running at 2 GHz, 1 Gb of RAM and 2 X 143 Gb hard disk storage (RAID-1 mode),
* 19" LCD colour monitor with keyboard and mouse,
* Load-lock with magnetic drive for 10 X 2" wafers or wafers up to Ø200 mm,
* Remote control through high speed internet with static IP address.