Corial is run by a team having more than 200 years of expertise in dry etching and plasma deposition! The key people have been developping processes and designing equipments in former etching/deposition companies as Nextral, Applied Materials and Alcatel. Their expertise lies in plasma physics and chemistry and in their experience of etching a wide range of material. It also lies in innovative tool design, in manufacturing excellence which gives rise to high performance, high quality, high reliability and low cost of ownership equipment.

Based on this expertise, a wide range of etching processes was built up. Most of the etchable materials have their own recipes, using either RIE or high density plasma sources (ICP, TCP and DECR/Microwave). Tool customization is performed through dedicated shuttles (exchangeable part of the cathode) for the highest process performance. PECVD deposited SiO2 films with tunable stress, very low H2 content and excellent refractive index uniformity were developed for integrated optics. SiO2 films with very high breakdown voltage were developed for MEMS applications.

Si3N4 films with either low or tunable stress and displaying low etch rate in KOH or TMAH are also available. The deposition temperature is ranging from 20 to 320°C with CORIAL tools.
The thorough knowledge of plasma physics and chemistry together with the extensive use of experimental design techniques (D.O.E.) enable CORIAL to  develop or tune process recipes to meet the most stringent customer needs.

Corial provides real-time process support through high speed internet communication with high level of security (VPN).

For more information about Corial, please read our documentation : PDF File - (1.8 Mo)