The Corial 200 series

The Corial 200 series are systems which can be equipped either with reactive ion etching reactors (RIE) or high density plasma reactors (DECR/Microwave, ICP and TCP). All have a wide range of working conditions. They all allow highly uniform processes on large areas (200 mm).

. Deposition of SiO2, Si3N4, aSiH, SiC
. Low Temperature Deposition of SiO2 and Si3N4
. Silicon compounds and polymer etching
. Metal etching with chlorinated chemistry
. III-V and II-VI compounds etching
. Sapphire and GaN etching
. Failure Analysis (Delayering)
. Low damage etching