Corial 400L

* Very large area RIE reactor (500 mm square) designed for uniform etching of 14" X 14" substrates,
* Vacuum vessel heating to avoid by-product condensation,
* 400 mm square cathode with Helium Backside cooling of the substrate table,
* Very high conductance pumping system ISO 200 with Alcatel ADP 122P dry pump rated at 95 m3/h and Alcatel ATH 1600 M, magnetically levitated turbomolecular pump (1600 l/s, Flow Rate: 1000 sccm at 20 mT),
* Gate valve ISO 200 for fast reactor venting and pumping without stopping the turbomolecular pump,
* MKS capacitance gauge 0 - 1 Torr for process pressure control,
* Automatic pressure control with throttle valve,
* CPU process controller (Processor ARM 926 180 MHz,  embedded software in 128 Mo Compact Flash , fast Ethernet link 100 MHz, 64 Mo of SDRAM, CAN bus, RS232),
* A set of digital and analogic Input/output module with a ARM7 processor connected to the CPU process controller via CAN bus for driving the physical devices,
* Gas box with 5 MFCs (O2, CHF3, SF6, Cl2, BCl3) - Max: 8 gas lines,
* 2000 W RF generator at 13.56 MHz and automatic match box,
* Haake chiller (Cooling power extracted at -20°C : 0.5 KW),
* Graphic User Interface through IBM PC operating under Linux and Firefox. It is equipped with Intel Quad-Core processor running at 2 GHz, 1 Gb of RAM and 2 X 143 Gb hard disk storage (RAID-1 mode),
* 19" LCD colour monitor with keyboard and mouse,
* Load-lock with vacuum robot for 14” X 14" glass substrates,
* Remote control through high speed internet with static IP address.